PL Series
EZImprinting introduces a bench-top, stand-alone nanoimprint platform: The PL series PL200/400/600. This platform provides a mechanical stage with micro-positioning fixtures for mounting a nanoimprint chamber, UV-curing source, and alignment microscope. It functions both as a nanoimprint system and as a traditional mask aligner while providing programmable, automatic control of your entire imprinting process.
EZImprinting Advantages
PL400 with alignment microscope
PL400 with UV LED source
EZImprinting Process Specifications
PL200 | PL400 | PL600 | |
---|---|---|---|
Substrate size | 2" standard (smaller sizes, irregular shapes compatible) | 4" standard (smaller sizes, irregular shapes compatible) | 6" standard (smaller sizes, irregular shapes compatible) |
Imprint area | Same as wafer size | Same as wafer size | Same as wafer size |
Mold plate size | 2" and 1" | 4", 2" and 1" | 6", 4", 2" and 1" |
Imprint pressure | 1 psi standard | ||
Mold/substrate Auto-Release | Included- no special tools needed | ||
UV exposure time | 2-3 min at 95% intensity level | ||
Alignment capability | X, Y, Z and theta (accuracy 2 μm) |
Technical Specifications
Control box operating pressure | 45 psi standard |
Control box vacuum | < -14 psi |
LED light source | 2" diameter, >5W |
Filtered pressure source | 70-100 psi |
Vacuum source | < -14 psi |
Power | 110-220V, 50/60Hz |
Classroom class | Class 1000 or better |
Stage | 17" x 15.5" x 10.5", 80 lbs. |
Touchscreen controller | 6" x 8" x 2.5", 1.5 lbs. |
Electronic control box | 17" x 14.5" x 5.5", 11.5 lbs. |
LED UV light source | 11" x 11" x 4.5", 7 lbs. |